Powder Low-Temperature (Room Temperature) ALD Film Deposition Device CMP-400
It is said to be difficult in ALD, but it is possible to form a powder film at low temperature (room temperature) and atmospheric pressure!
**Features** - Powder film formation using swirling flow under atmospheric pressure - Control of film thickness according to application - Film formation possible at room temperature **Application Examples** - SiO and Al2O3 film formation for all-solid-state battery powders **Consultation for Film Formation and Test Coating Available** At Creative Coatings, we accept test coatings and sample creation. We can listen to your requests and suggest suitable equipment, types of films, and film thicknesses. Please feel free to consult with us. ++++++++++++++++++++++++++++++ We provide next-generation vapor phase technology demanded by the times and the environment. We contribute to technological innovation with our dual technology of low-temperature (room temperature) ALD equipment for semiconductors and powder low-temperature (room temperature) ALD film formation equipment.
- Company：Creative Coatings Co., Ltd.
- Price：Other
